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ASM公司保持ALD领导者地位 Pulsar系统出货量达到100套

来源:SEMI中国 作者:—— 浏览:1778

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摘要:ASM International N.V日前宣布其原子层沉积系统(ALD)Pulsar出货量达到100套。领先的Pulsar设备在全球30多家晶圆工厂成功安装,用于量产及工艺开发。Pulsar 3000并被Semiconductor International评选为2008年编辑最佳产品(2008 ‘Editor’s Choice Best Product.’)。ASM America总经理Pe


ASM International N.V日前宣布其原子层沉积系统(ALD)Pulsar出货量达到100套。

领先的Pulsar设备在全球30多家晶圆工厂成功安装,用于量产及工艺开发。Pulsar 3000并被Semiconductor International评选为2008年编辑最佳产品(2008 ‘Editor’s Choice Best Product.’)。

ASM America总经理Peo Hansson表示,Pulsar凭其突破性技术打入市场,正应用于高k及其他工艺的量产。ASM开发的多工艺应用及简化集成方案令Pulsar广泛接受,并确立了ASM在ALD领域的领导者地位。

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ASM Ships 100th Pulsar ALD Tool
Pulsar is Industry Leading Process Module for Depositing High-K Gate Dielectrics

BILTHOVEN, THE NETHERLANDS, July 15, 2008 -- ASM International N.V. (NASDAQ: ASMI and Euronext Amsterdam: ASM), announced that it has delivered its 100th Pulsar? atomic layer deposition (ALD) process module. This milestone positions Pulsar as the industry-leading ALD platform, installed in over 30 fabs worldwide for high volume manufacturing, pilot production and process development. Further highlighting its leadership within this market, Semiconductor International recently named the Pulsar 3000 a 2008 ‘Editor’s Choice Best Product.’

“Pulsar was first to market with its breakthrough technology, and is running in volume production for high-k gates and for several other applications,” explained Peo Hansson, general manager of ASM America, Inc. “ASM’s ability to deliver a variety of process applications and simplify integration has driven Pulsar’s adoption and established ASM as the clear leader in ALD technology.”

Films available for Pulsar include hafnium- and zirconium-based oxide films for high-k gates, lanthanum oxide and aluminum oxide for dielectric caps needed to tune metal gate work function and high deposition rate aluminum oxide for flash inter-poly dielectrics. In addition to high-k films for logic and? flash gate stacks, the flexibility of the Pulsar is further evidenced by its ALD processes for magnetic read/write (R/W) heads, ferroelectric RAM (FeRAM),? microelectromechanical systems (MEMS) devices and organic light-emitting diode (OLED) devices.

Pulsar’s technology is further strengthened by the company’s MicroChemistry group, which invented ALD. ASM is becoming increasingly focused on the exploration and delivery of new materials that can be deposited using Pulsar’s ALD technology. The company’s ability to fine tune materials for specific applications allows its customers to shrink transistors with simple scaling, while the development of new high-k materials will enable the extension of ALD for many process nodes.

About ASM
ASM International N.V. and its subsidiaries design and manufacture equipment and materials used to produce semiconductor devices. The company provides production solutions for wafer processing (Front-end segment) as well as assembly and packaging (Back-end segment) through facilities in the United States, Europe, Japan and Asia. ASM International"s common stock trades on NASDAQ (symbol ASMI) and the Euronext Amsterdam Stock Exchange (symbol ASM). For more information, visit ASMI"s web site atwww、asm、com.


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型号 厂商 价格
EPCOS 爱普科斯 /
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STM32F030C8T6 ST ¥18.11
N76E003AT20 NUVOTON ¥9.67
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