业界领先的光刻光源制造商Cymer宣布全球首款场选择60W-90W沉浸式光源——XLR 600ix已集成至Nikon扫描光刻机，并成功在一家大型亚洲芯片商中投入使用。该里程碑标致着此类光源得到了主流芯片商的采用，并表明芯片商对于Cymer XLR平台的认可。

WORLD’S FIRST FIELD-SELECTABLE 60W–90W IMMERSION LIGHT SOURCE—CYMER’s XLR 600ix—INSTALLED AT LARGE ASIAN CHIPMAKER

SAN DIEGO (July 21, 2009)—Cymer, Inc. (Nasdaq: CYMI), the market’s leading developer of light sources used to pattern advanced semiconductor chips, announced today that the world’s first field-selectable 60 watt–90 watt (W) immersion light source—the XLR 600ix—has been integrated into a Nikon scanner, and successfully installed at a large Asian chipmaker. This milestone represents the first immersion light source of this kind to be installed at a major chipmaker, and demonstrates chipmakers’ continued recognition of Cymer’s XLR platform as the light source of choice for immersion lithography.

“Cymer’s XLR 600ix, with 90W capability, enables our scanners to meet chipmakers’ high throughput requirements for double patterning at the 32 nm process node and beyond,” said Mr. Toshikazu Umatate, vice president, Precision Equipment Company, Nikon Corporation. Introduced in February 2009, the XLR 600ix delivers improved on-wafer performance to chipmakers, and offers newly developed optics technology for higher-powered applications. The light source also provides industry-leading performance enhancements over the XLR 500i, including a 1.5x improvement in wavelength and bandwidth stability and a 2x improvement in dose stability. To-date, all of the industry’s immersion double patterning light source selections in 2009 have been awarded to Cymer.

“Cymer is committed to providing solutions that enable next-generation lithography, and we’re proud to strengthen our partnership with Nikon through this installation, while enabling their customer to advance its competitive position with this leading-edge tool,” said Ed Brown, president and chief operating officer for Cymer. “The XLR 600ix’s unique ability to operate from 60W to 90W, coupled with its optical performance improvement and overall low-cost benefits were drivers in the selection of our light source for this application.”

Cymer’s XLR 600ix comes equipped with Gas Lifetime eXtension? technology, which reduces light source downtime during gas exchanges by a factor of 20, while improving performance stability. The XLR 600ix is also available with Cymer’s OnPulse? Laser Life Program, which guarantees a year-over-year per-pulse cost savings for the life of the light source, and stable, predictable running costs that scale with the level of wafer production.

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