全球领先的光掩膜激光图形生成器（laser pattern generators）供应商Micronic Laser Systems AB收到公司历史上最大的一笔订单，订单来自一家日本客户，订购两套G10图形生成器用于显示器光掩膜生产。

该套G10系统将被用于生产先进光掩膜，可以低本高效制造60寸显示器产品。首套系统将在2008年下半年发货至厂家

Micronic receives order for two pattern generators of a new generation for the production of display photomasks

Taby, Sweden – September 6, 2007 – Micronic Laser Systems AB (OMX Nordic Exchange Stockholm, Nordic list, Mid Cap, Information Technology: MICR), a leading global supplier of laser pattern generators for photomasks, has today received an order for two pattern generators for the production of display photomasks from a customer in Japan. The systems will be used to produce advanced photomasks including next generation display manufacturing, so called G10. These photomasks will enable cost effective production of display sizes over 60”.
”This is the largest order in the company’s history,” said Sven Lofquist, president and CEO of Micronic Laser Systems. “The market for pattern generators for display photomasks has been standing still for more than a year, which is challenging, but cyclical buying is not unusual for the capital equipment industry serving strong growth markets. We now see a gradual recovery in demand for pattern generators, mainly driven by the technology development in terms of systems for larger photomasks in combination of higher precision, image quality and productivity. This double order involves some degree of new development with an emphasis on larger writing area. The first system is scheduled for delivery in the second half of 2008.”

“The development of new generation fabs leads to a more cost effective production of display panels. It is very satisfying that Micronic’s systems continue to play a central role in the development of the display industry, which is rapidly approaching 100 billion US dollars,” concluded Sven Lofquist.